PT Journal
AU Pudis, D
   Kubicova, J
   Suslik, L
   Skriniarova, J
   Martincek, I
   Novotny, I
TI Patterning Techniques for Fabrication of Submicrometer Structures in Photoresist, III-V Semiconductors and PMMA
SO Communications - Scientific Letters of the University of Zilina
PY 2010
BP 53
EP 57
VL 12
IS 2
DI 10.26552/com.C.2010.2.53-57
WP https://komunikacie.uniza.sk/artkey/csl-201002-0011.php
DE no keywords
SN 13354205
AB This paper presents experimental results in the field of planar periodic structures, their fabrication and analysis. We demonstrate techniques and experimental results of fabrication of two-dimensional periodic structures and their preparation in a thin photoresist layer, III-V semiconductors and PMMA - interference lithography using two coherent laser beams, nanoimprint lithography and lithography using nearfield scanning optical microscope.
ER