RT Journal Article
SR Electronic
A1 Pudis, Dusan
A1 Kubicova, Jarmila
A1 Suslik, Lubos
A1 Skriniarova, Jaroslava
A1 Martincek, Ivan
A1 Novotny, Ivan
T1 Patterning Techniques for Fabrication of Submicrometer Structures in Photoresist, III-V Semiconductors and PMMA
JF Communications - Scientific Letters of the University of Zilina
YR 2010
VO 12
IS 2
SP 53
OP 57
DO 10.26552/com.C.2010.2.53-57
UL https://komunikacie.uniza.sk/artkey/csl-201002-0011.php
AB This paper presents experimental results in the field of planar periodic structures, their fabrication and analysis. We demonstrate techniques and experimental results of fabrication of two-dimensional periodic structures and their preparation in a thin photoresist layer, III-V semiconductors and PMMA - interference lithography using two coherent laser beams, nanoimprint lithography and lithography using nearfield scanning optical microscope.