Communications - Scientific Letters of the University of Zilina 2017, 19(3):57-61 | DOI: 10.26552/com.C.2017.3.57-61

Statistical and Fractal Analysis of Random Height Function

Stanislav Jurecka1, Maria Jureckova2
1 Institute of Aurel Stodola, University of Zilina, Liptovsky Mikulas, Slovakia
2 Mathematical Institute, Slovak Academy of Sciences, Bratislava Slovakia and Catholic University in Ruzomberok, Slovak Republic

Nanostructured semiconductor surfaces are commonly used for suppression of the light reflection. We prepared several kinds of surface structures on silicon substrate and analyzed the properties of the random height function used for the description of observed surface morphology. Statistical and fractal methods used in this analysis provide useful information for the optimization of the surface forming procedure. Multifractal analysis provides additional information about the surface morphology, not contained in the results of standard statistical methods. Numerical procedures used in the multifractal analysis were tested by using theoretical random height function created from large sets of Cantor numbers.

Keywords: multifractal analysis; statistical methods; semiconductor structures

Published: September 30, 2017  Show citation

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Jurecka, S., & Jureckova, M. (2017). Statistical and Fractal Analysis of Random Height Function. Communications - Scientific Letters of the University of Zilina, 19(3), 57-61. doi: 10.26552/com.C.2017.3.57-61
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