Communications - Scientific Letters of the University of Zilina 2010, 12(2):53-57 | DOI: 10.26552/com.C.2010.2.53-57

Patterning Techniques for Fabrication of Submicrometer Structures in Photoresist, III-V Semiconductors and PMMA

Dusan Pudis1, Jarmila Kubicova1, Lubos Suslik1, Jaroslava Skriniarova2, Ivan Martincek1, Ivan Novotny2
1 Department of Physics, University of Zilina, Slovakia
2 Department of Microelectronics, Slovak University of Technology, Bratislava, Slovakia

This paper presents experimental results in the field of planar periodic structures, their fabrication and analysis. We demonstrate techniques and experimental results of fabrication of two-dimensional periodic structures and their preparation in a thin photoresist layer, III-V semiconductors and PMMA - interference lithography using two coherent laser beams, nanoimprint lithography and lithography using nearfield scanning optical microscope.

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Published: June 30, 2010  Show citation

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Pudis, D., Kubicova, J., Suslik, L., Skriniarova, J., Martincek, I., & Novotny, I. (2010). Patterning Techniques for Fabrication of Submicrometer Structures in Photoresist, III-V Semiconductors and PMMA. Communications - Scientific Letters of the University of Zilina, 12(2), 53-57. doi: 10.26552/com.C.2010.2.53-57
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