Communications - Scientific Letters of the University of Zilina 2014, 16(1):21-25 | DOI: 10.26552/com.C.2014.1.21-25

NSOM Lithography for Organized Growth of Gap Nanowires

Ivana Lettrichova1, Dusan Pudis1, Agata Laurencikova2, Stanislav Hasenohrl2, Jozef Novak2, Jaroslava Skriniarova3
1 Div. of Optics and Photonics, Dept. of Physics, University of Zilina, Slovakia
2 Inst. of Electrical Engineering, Slovak Academy of Sciences, Bratislava, Slovakia
3 Inst. of Electronics and Photonics, Slovak University of Technology, Bratislava, Slovakia

In this contribution, near field scanning optical microscope (NSOM) lithography is presented as a tool for organized growth of nanowires. Non contact mode of NSOM lithography was used to pattern planar structures in photoresist deposited on GaP substrate. In combination with lift-off technique, metal-catalyst particles on GaP substrate for subsequent growth of GaP nanowires were prepared. Different periodic and predefined arrangements of GaP nanowires were achieved.

Keywords: NSOM lithography, predefined structure, organized nanowire growth

Published: February 28, 2014  Show citation

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Lettrichova, I., Pudis, D., Laurencikova, A., Hasenohrl, S., Novak, J., & Skriniarova, J. (2014). NSOM Lithography for Organized Growth of Gap Nanowires. Communications - Scientific Letters of the University of Zilina, 16(1), 21-25. doi: 10.26552/com.C.2014.1.21-25
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